This application note describes the conditions for the determination of trace sulfur compounds using the PFPD.
This document is an application note from Agilent Technologies regarding the analysis of low-level sulfur compounds. It highlights the effectiveness of selective detection methods, specifically PFPD, combined with Thick-film CP-Sil 5CB columns for guaranteed elution of difficult sulfur compounds at trace levels.
The note provides specific experimental parameters for the analysis, including column dimensions, carrier gas flow, oven temperature programming, injection settings, and detector temperature. It also lists a series of identified sulfur compounds, ranging from hydrogen sulfide to various mercaptanes and sulfides, with corresponding retention times or peak numbers.
| Column | Fused silica 50m x 0.32mm CP-Sil 5 CB, df= 5 ym |
|---|---|
| Part no. | CP7690 |
| GC Model | CP3800 |
| Carrier Gas | Helium, 2 mL/min, 12 psi, 85 kPa |
| Oven Temp. Program | -20°C, 3.5min -> 10°C/min -> 250°C |
| Injection Volume | Approx 100 ul |
| Split Ratio | 1:30 |
| Detector Temp. | 250 °C |
| Concentration | Approx. 7 ppm in helium |
The method allows for the measurement of low level sulfur compounds at a concentration of approximately 7 ppm in helium.
The specified column is fused silica with dimensions of 50m x 0.32mm and a film thickness (df) of 5 µm.
The procedure requires a helium carrier gas flow rate of 2 mL/min at 12 psi or 85 kPa.