This application note demonstrates the suitability of a newly developed, high sensitivity reaction cell inductively coupled plasma mass spectrometer (ICP-MS) for the deter- mination of inorganic impurities in semiconductor-grade tetramethyl ammonium hydroxide (TMAH).
This document details the analysis of inorganic impurities in semiconductor-grade tetramethyl ammonium hydroxide (TMAH) using the Agilent 7500cs Inductively Coupled Plasma Mass Spectrometer (ICP-MS). The study highlights the instrument's capability to meet Semiconductor Equipment and Materials International (SEMI) Tier A specifications for various metals.
The analysis addresses challenges posed by matrix-based polyatomic interferences caused by the high carbon content of TMAH. The Agilent 7500cs features a high-sensitivity Octopole Reaction System (ORS) that uses hydrogen and helium gases to eliminate plasma and matrix-based polyatomics, ensuring excellent ion transmission and sensitivity for elements such as K, Mg, Ca, Al, Cr, Fe, Co, Ni, and Cu.
| RF power | 1600W |
|---|---|
| Sampling depth | 8mm |
| Carrier gas flow | 0.7 L/min |
| Makeup gas flow | 0.54 L/min |
The concentrated 25% TMAH is diluted 5-fold with ultra-pure deionized water to create a 5% w/w solution.
The high-sensitivity version of the Octopole Reaction System (ORS) is used to attenuate matrix and plasma-based interferences.