Agilent 7500a ICP-MS for Nickel Alloy Production Control Application Note

Laser Ablation (LA)-ICP-MS for Production Control of Nickel Alloys


Agilent 7500a ICP-MS for Nickel Alloy Production Control Application Note - cover page
Brand
Agilent
Document type
Application Note
Language
English
Pages
6
File format
PDF
File size
499 KB
Published
02 July, 2012
Updated
30 September, 2023
Model
7500a
MD5 checksum
CC0AD65DF664D00C46E49728C93767B3

About this manual

Nickel alloys are critical components in industries like aerospace and energy, requiring strict control over physical properties and trace metal contaminants. Traditional methods like X-ray Fluorescence (XRF) may struggle with the increasingly stringent specifications for impurity levels required by modern high-performance materials.

This document details an evaluation of Laser Ablation Inductively Coupled Plasma Mass Spectrometry (LA-ICP-MS) as a superior method for routine monitoring. The study utilized a New Wave UP266 MACRO laser system coupled with an Agilent 7500a ICP-MS to analyze nickel-base superalloys, demonstrating improved detection limits and accuracy compared to traditional instrumentation.

What's inside

  • Laser Ablation (LA)-ICP-MS
  • Nickel Alloy Production Control
  • Trace Element Monitoring
  • Agilent 7500a System Parameters
  • Matrix Interferences in Ni-Alloys
  • Comparison with XRF and OES
  • Calibration Standards for Metals
  • Impurity Effects on Mechanical Properties

Specifications

Laser Spot Size515 um
Laser Energy60 %
Repetition Rate10 Hz
Line Speed30 um/s
Forward Power1350 W
Carrier Gas Flow12 L/min

Frequently asked questions

What laser system was used in this evaluation?

The study utilized the New Wave UP266 MACRO laser system.

Which ICP-MS instrument is recommended for this application?

The Agilent 7500a ICP-MS system was used in the evaluation.

How does LA-ICP-MS compare to traditional techniques?

LA-ICP-MS provides acceptable limits of detection, accuracy, recovery, and long-term stability at lower levels than X-ray Fluorescence and Optical Emission Spectroscopy.

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