Direct measurement of metallic impurities in 20% ammonium hydroxide by Agilent 7700s ICP-MS
Ammonium hydroxide (NH4OH) is a chemical used in semiconductor manufacturing that must be analyzed for trace metal impurities. Direct analysis of undiluted 20% NH4OH by ICP-MS is challenging due to high vapor pressure causing plasma instability and the risk of metal precipitation.
The application limits spike concentrations to 100 ppt in 20% ammonium hydroxide to prevent metal precipitation.
The complete analysis cycle for each sample takes 8 minutes and 20 seconds.
The instrument maintained a signal stability of approximately 5% RSD over just under 7 hours.