Agilent 7700s ICP-MS Direct Measurement of Metallic Impurities in Ammonium Hydroxide Application Note

Direct measurement of metallic impurities in 20% ammonium hydroxide by Agilent 7700s ICP-MS


Agilent 7700s ICP-MS Direct Measurement of Metallic Impurities in Ammonium Hydroxide Application Note - cover page
Brand
Agilent
Document type
Application Note
Language
English
Pages
6
File format
PDF
File size
231 KB
Published
11 June, 2012
Updated
30 September, 2023
Model
7700s
MD5 checksum
E53EAA53DBA1D8FA6E088C50EE614CC8

About this manual

Ammonium hydroxide (NH4OH) is a chemical used in semiconductor manufacturing that must be analyzed for trace metal impurities. Direct analysis of undiluted 20% NH4OH by ICP-MS is challenging due to high vapor pressure causing plasma instability and the risk of metal precipitation.

What's inside

  • Introduction
  • Experimental
  • Results
  • Long term stability
  • Conclusions

Frequently asked questions

What is the maximum spike concentration used for Method of Standard Additions calibration to avoid precipitation?

The application limits spike concentrations to 100 ppt in 20% ammonium hydroxide to prevent metal precipitation.

How long does the total run time per sample take including uptake and rinse?

The complete analysis cycle for each sample takes 8 minutes and 20 seconds.

What is the approximate relative standard deviation achieved during the long-term stability test?

The instrument maintained a signal stability of approximately 5% RSD over just under 7 hours.

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