This study outlines the methodology of using Zeeman graphite furnace atomic absorption (AA) for the determination of Pb, Tl, Bi, Ga, and Sn in high purity sulfuric acid. High purity acids are widely used in the semiconductor industry for various purposes. The study involved diluting 500 grams of high purity sulfuric acid to 1000 mL and analyzing unspiked and spiked samples for the five elements. The graphite furnace AA method provides the necessary sensitivity and precision to analyze metals at part-per-billion levels.
The document outlines a methodology for analyzing trace metals at part-per-billion levels in high purity sulfuric acid, which is widely used in the semiconductor industry. The study utilized a SpectrAA-400 Zeeman spectrometer with platform atomization techniques and chemical modifiers to minimize interferences.
Specific furnace temperature programs and autosampler parameters are provided for five elements: Pb, Tl, Bi, Ga, and Sn. The analysis achieved characteristic concentrations below 1 pg/L, demonstrating the sensitivity required for routine determination of contaminants in semiconductor-grade acids.
The study outlines a methodology for analyzing five specific elements: lead (Pb), thallium (Tl), bismuth (Bi), gallium (Ga), and tin (Sn).
A spike level of 10 pg/L was applied to all five elements during the study.
For the study, 500 grams of high purity sulfuric acid was diluted to a total volume of 1000 mL.