This document introduces a method for determining trace impurities in high-purity copper by sequential ICP-OES with axial viewing, which has high sensitivity and accuracy.
The document details a method for analyzing trace impurities in high-purity metals and alloys, specifically focusing on copper. It compares the performance of Inductively Coupled Plasma-Optical Emission Spectrometry (ICP-OES) with radial versus axial plasma viewing configurations.
The study utilizes an Agilent Liberty Series II ICP-OES equipped with an AGM 2 nitrogen purge accessory and a glass cyclonic spray chamber. The method involves dissolving copper samples in nitric acid and performing matrix-matched calibration to determine concentrations of elements such as Arsenic, Bismuth, Iron, Nickel, Phosphorus, Lead, Antimony, Tin, and Zinc.
| Power | 1.2 kW |
|---|---|
| Plasma gas flow rate | 15 L/min |
| Auxiliary gas flow rate | 1.5 L/min |
| Spray chamber type | Glass cyclonic spray chamber with concentric nebulizer |
| Integration time | 3 seconds |
| PMT voltage | 650 V |
An Agilent Liberty Series II ICP-OES with axial viewing of the plasma.
The average improvement factor with axial viewing is 2-3 times when using the same sample introduction system.