This document introduces the performance of Agilent Technologies' 7500s ICP-MS in the determination of ultratrace levels of metals in HF and H2O2.
The Agilent 7500s ICP-MS is designed to meet the SEMI Tier D guidelines for measuring contaminant levels of up to 10 ppt in hydrogen peroxide (H2O2) and hydrofluoric acid (HF). These reagents are critical in semiconductor manufacturing for cleaning silicon wafers, requiring extremely high purity to avoid surface contamination.
The instrument achieves this through direct analysis of concentrated samples using a trace metal-free sample introduction system. Key features include a robust 27 MHz RF plasma, the exclusive ShieldTorch System to remove interferences, and the I-AS semiconductor auto-sampler for cleanroom-ready operation. The document provides detection limits and spike recovery data for 21 specific elements.
| RF Plasma Frequency | 27 MHz |
|---|---|
| Sample Introduction System | O-ring free, PFA |
The proposed maximum contaminant level is 10 ppt for 21 elements.
Agilent's exclusive ShieldTorch System is used to effectively remove argon and matrix based interferences.