The VTC-2D is a small‑scale DC plasma magnetron sputtering coating instrument designed for laboratory metal‑film deposition. It includes a 500 W/600 V DC power supply, a 2‑inch water‑cooled sputtering head, a quartz vacuum chamber, a vacuum pump, and a temperature controller. Optional accessories such as a 1‑inch sputtering head and a molecular pump are available.
The system features a rotatable, heated sample stage (diameter 50 mm, up to 2‑inch substrates) with rotation speeds of 1‑10 rpm and a maximum temperature of 700 °C (±1.0 °C). A quartz‑vibrating film thickness monitor provides real‑time thickness measurement with 0.10 Å resolution. Safety notes advise using high‑purity inert gases (>5N) and optional gas‑purification or RF power for non‑conductive targets. This manual is written in Chinese.
| Model | VTC-2D |
|---|---|
| Input Power | 220 VAC 50/60 Hz, single‑phase 1000 W (incl. vacuum pump) |
| Power Supply | 500 W, 600 V DC |
| Vacuum Chamber Size | 160 mm × 150 mm × 250 mm |
| Chamber Material | High‑purity quartz |
| Sealing Flange Diameter | 165 mm |
| Vacuum Level (rotary vane pump) | 10⁻⁵ Torr |
| Sample Stage Diameter | 50 mm |
| Maximum Substrate Size | 2 inch |
| Rotation Speed | 1‑10 rpm |
| Maximum Heating Temperature | 700 °C |
| Temperature Control Accuracy | ±1.0 °C |
| Cooling Water Flow Rate | 10 ml/min |
The sample stage can hold substrates up to 2 inches in diameter.
The stage can be heated up to 700 °C with a temperature control accuracy of ±1.0 °C.
Both a direct‑connected rotary vane pump and an optional German‑made molecular pump can be used.
A 500 W, 600 V DC power supply is integrated in the system.