Mirco/Nano Technology Research Center FLX 2320 Stress Measurement System SOP

Standard operating procedure for the FLX 2320 stress measurement system, covering setup, single‑time and temperature scans, and data analysis.


Mirco/Nano Technology Research Center FLX 2320 Stress Measurement System SOP - cover page
Brand
成大微奈米研究中心
Category
Other
Document type
User Manual
Language
English
Pages
15
File format
PDF
File size
613 KB
Published
05 January, 2012
Updated
29 September, 2026
MD5 checksum
298EC8FDD8C51B405F6BA0999BF7CE9F

About this manual

The SOP describes the purpose and scope of the FLX 2320 Stress Measurement System, a thin‑film stress analysis instrument. It outlines the theoretical basis (Stoney’s equation) and provides the required material parameters for stress calculations.

Operational instructions cover single‑time scans, temperature scans, program loading, data processing, and graphing of results. Each procedure is broken into step‑by‑step actions, including sample placement, heater control, and data file handling.

What's inside

  • Introduction
  • Stoney’s Equation
  • Material Parameters
  • Single Scan Procedure
  • Temperature Scan Procedure
  • Program Loading and Editing
  • Data Processing and Saving
  • Graphing and Trend Plot

Specifications

Elastic modulus (E/(1‑ν))180.5 GPa
Film thickness (h)525 µm
Substrate thickness (t)7500 Å

Frequently asked questions

Which equation is used to calculate thin‑film stress?

The SOP uses Stoney’s equation for stress calculation.

What are the required material parameters for the stress calculation?

The required parameters are E/(1‑ν) = 180.5 GPa, film thickness h = 525 µm, substrate thickness t = 7500 Å, and biaxial modulus dν = 4.

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