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Featured 成大微奈米研究中心 manuals
Mirco/Nano Technology Research Center FLX 2320 Stress Measurement System SOP
The SOP describes the purpose and scope of the FLX 2320 Stress Measurement System, a thin‑film stress analysis instrument. It outlines the theoretical basis (Stoney’s equation) and provides the required material parameters for stress calculations.
Operational instructions cover single‑time scans, temperature scans, program loading, data processing, and graphing of results. Each procedure is broken into step‑by‑step actions, including sample placement, heater control, and data file handling.
Covers: Introduction · Stoney’s Equation · Material Parameters · Single Scan Procedure · Temperature Scan Procedure · Program Loading and Editing
Latest 成大微奈米研究中心 manuals
Mirco/Nano Technology Research Center FLX 2320 Stress Measurement System SOP
User Manual 15 pages · 613 KB · ENStandard operating procedure for the FLX 2320 stress measurement system, covering setup, single‑time and temperature scans, and data analysis.
Which document do I need?
User Manual
Day-to-day operation, settings and troubleshooting. Start here if the product is already set up.
Questions answered in 成大微奈米研究中心 manuals
Which equation is used to calculate thin‑film stress?
The SOP uses Stoney’s equation for stress calculation.
From: Mirco/Nano Technology Research Center FLX 2320 Stress Measurement System SOP
What are the required material parameters for the stress calculation?
The required parameters are E/(1‑ν) = 180.5 GPa, film thickness h = 525 µm, substrate thickness t = 7500 Å, and biaxial modulus dν = 4.
From: Mirco/Nano Technology Research Center FLX 2320 Stress Measurement System SOP