Three tools for the rapid prototyping of micron and sub-micron scale devices are presented. These tools represent methods for the manufacture of PEMS, or Printed micro Electro Mechanical Systems, and are enabled because they exploit the novel properties of nanocrystalline materials and their interactions with energetic beams. UV contact mask lithography was used to directly pattern metallic nanocrystals on glass and polyimide surfaces without vacuum or etching processes or the use of photoresist layers. Direct electron beam lithography technology is used to directly generate nanohole arrays on quartz glass and polyimide surfaces.
The thesis describes three novel tabletop tools that enable rapid fabrication of micron and sub‑micron devices. UV contact mask lithography patterns metallic nanocrystals on glass and polyimide without vacuum, etching, or photoresist layers. Direct electron‑beam lithography creates multi‑layer, multi‑material structures with feature sizes down to 100 nm.
A micro‑mirror array based selective laser sintering apparatus provides maskless patterning of printed electro‑mechanical systems (PEMS) and produces elastomeric stamps for nano‑embossing. The work evaluates these methods against traditional photolithography, highlighting speed and resolution advantages.
UV contact mask lithography was used to directly pattern metallic nanocrystals on glass and polyimide surfaces without vacuum or etching processes or the use of photoresist layers.
Direct electron beam lithography of nanocrystalline metals was used to pattern structures with minimum feature sizes of 100 nm.
A micro‑mirror array based selective laser sintering apparatus was built for the rapid, maskless patterning of PEMS.