Three tools for the rapid prototyping of micron and sub-micron scale devices are presented. These tools represent methods for the manufacture of PEMS, or Printed micro Electro Mechanical Systems, and are enabled because they exploit the novel properties of nanocrystalline materials and their interactions with energetic beams. UV contact mask lithography was used to directly pattern metallic nanocrystals on glass and polyimide surfaces without vacuum or etching processes or the use of photoresist layers. Direct electron beam lithography technology is used to directly generate nanohole arrays on quartz glass and polyimide surfaces.
