Update: 28 September, 2023
This application note demonstrates the suitability of a newly developed, high sensitivity reaction cell inductively coupled plasma mass spectrometer (ICP-MS) for the determination of inorganic impurities in semiconductor grade sulfuric acid. The Agilent 7500cs ICP-MS, featuring a high sensitivity version of the Octopole Reaction System (ORS), was used to analyze sulfuric acid for all the metals required by the semiconductor industry. The enhanced ORS eliminates all plasma and matrix based polyatomics that interfere with the measurement of elements such as K, Ca, Ti, Cr, Fe, Co, Ni, Cu, and Zn while offering excellent ion transmission and sensitivity. Furthermore, all analytes can be measured at high plasma power to promote complete decomposition of the sulfuric acid in the plasma. This leads to high signal stability and a reduced frequency of routine maintenance. Sample preparation is a simple 10x dilution followed by direct analysis thereby significantly reducing the potential for the sample contamination frequently encountered with evaporative matrix elimination techniques.
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MD5 Checksum: 5C7024A646088498EDD8954395C869AD
Publication date: 02 July, 2012
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