Key facts
- Manuals
- 1
- Languages
- EN
- Last added
- 2026-09-30
Featured Mesc manuals
Mesc Multiplex ICP Operator's Manual
The Multiplex ICP is a manual loadlock, HF inductively coupled plasma (ICP) etch system designed for research, development, and small‑scale production. It can process single 75 mm (3 in.) or 100 mm (4 in.) wafers and includes a combined ICP electronics unit, loadlock assembly, wafer loader, and process chamber with high‑density plasma generated at 13.56 MHz.
System control is provided by a standard PC running Windows, with a colour monitor that displays process information and allows recipe loading from hard or floppy disks. Safety is ensured by interlock displays, an emergency‑stop button, and multiple circuit breakers protecting power, RF, and pump supplies.
Covers: System description · System configuration · Computer control system · Prime power distribution drawer · Power distribution panel · Electrostatic chuck unit
Latest Mesc manuals
Mesc Multiplex ICP Operator's Manual
User Manual 56 pages · 21.4 MB · ENThe Mesc Multiplex ICP Operator's Manual describes the manual loadlock HF inductively coupled plasma etch system, its components, and operating procedures.
Which document do I need?
User Manual
Day-to-day operation, settings and troubleshooting. Start here if the product is already set up.
Questions answered in Mesc manuals
What wafer sizes can the Multiplex ICP process?
It can process single wafers of either 75 mm (3 in.) or 100 mm (4 in.) size.
How is the system controlled?
The system is controlled by a standard PC running Windows, with a colour monitor that displays process information and allows recipe loading.